Объекты, где автором является "Ronald K."

Статья

Tarakanov V. P., Shustin E. G., Ronald K. Simulation of sputtering from an isolated conductor surrounded by a ielectric during plasma etching. Vacuum , 2019 , 165 (2). С. 265-269. ISSN 0042207X

Shustin E.G., Tarakanov V.P., Ronald K. Computer simulation of the sheath and the adjacent plasma in the presence of a plasma source. Vacuum , 2017 , 135 (1). С. 1-6.