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Yurov V. Yu, Bolshakov A.P., Altakhov A.S., Fedorova I.A., Zavedeev E.V., Popovich A.F., Ralchenko V.G. Hydrogen microwave plasma etching of silicon dioxide at high temperatures with in situ low-coherence interferometry control. Vacuum , 2022 , 199. р. 110939. ISSN 0042207X