![]() | На уровень вверх |
Belorusov D. A., Goldman E.I., Chucheva G.V. Franz–Keldysh Effect in Silicon–Ultrafine (3.7 nm) Oxide– Polysilicon Structures. Journal of Communications Technology and Electronics , 2023 . ISSN 1064-2269
Afanasiev M.S., Belorusov D. A., Kiselev D.A., Chucheva G.V. Influence of the upper electrode material on the electrophysical properties of MDM structures based on ferroelectric films. Physics of the Solid State , 2023 . ISSN 1063-7834
Afanasiev M.S., Belorusov D. A., Kiselev D.A., Luzanov V.A., Chucheva G.V. Formation and study of metal-insulator-semiconductor structures based on hafnium oxide films. Physics of the Solid State , 2023 . ISSN 1063-7834
Belorusov D. A., Goldman E.I., Chucheva G.V. Ultrathin (3.7 nm) Silicon Oxide Layers with a Low Concentration of Broken Bonds on the Contact with a Semiconductor. Journal of Communications Technology and Electronics , 2023 . ISSN 1064-2269
Belorusov D. A., Goldman E.I., Chucheva G.V. A weak manifestation of the field effect in metal-dielectric-semiconductor structures with a ferroelectric insulating layer BaxSr1−xTiO3. Physics of the Solid State , 2022 . ISSN 1063-7834
Belorusov D. A., Goldman E.I., Chucheva G.V. The Effect Of A Strong Static Electric Field And Heating On Characteristics Of The High-Frequency Impedance Of Metal--Ferroelectric--Semiconductor Structures. Physics of the Solid State , 2022 . ISSN 1063-7834
Goldman E.I., Chucheva G.V., Belorusov D. A. On the form of high-frequency voltage-capacitance characteristics of metal-insulator-semiconductor structures with a ferroelectric insulating layer BaxSr1-хTiO3. Ceramics International , 2021 , 47 (15). С. 21248-21252. ISSN 0272-8842
Belorusov D. A., Goldman E.I., Naryshkina V.G., Chucheva G.V. Silicon Ultrathin Oxide (4.2 nm)–Polysilicon Structures Resistant to Field Damages. Semiconductor , 2021 , 55 (1). С. 21-24. ISSN 1063-7826
Afanasiev M. S., Belorusov D. A., Kiselev D. A.,, Sivov A. A. Dependence of the Electrophysical Characteristics of Metal–Ferroelectric–Semiconductor Structures on the Field-Electrode Material. Semiconductors , 2020 , 54 (11). С. 1225-1229. ISSN 1063-7826
Belorusov D. A., Goldman E.I., Chucheva G.V. Reasons for the weak manifestation of the field effect in metal-Ba1-хSrхTiO3-Si structures. In: 14-ая Межд.конф. “Микро - и наноэлектроника – 2021” (ICMNE-2021), 4-8 октября, Звенигород, Московская область, Россия , р. 90.