Temiryazev Alexei, Bozhko Sergey I., Robinson A. Edward, Temiryazeva Marina Fabrication of sharp atomic force microscope probes using in situ local electric field induced deposition under ambient conditions. REVIEW OF SCIENTIFIC INSTRUMENTS , 2016 , 87 (11).
Полный текст не доступен из этого репозитория.Аннотация
We demonstrate a simple method to significantly improve the sharpness of standard silicon probes for an atomic force microscope or to repair a damaged probe. The method is based on creating and maintaining a strong, spatially localized electric field in the air gap between the probe tip and the surface of conductive sample. Under these conditions, nanostructure growth takes place on both the sample and the tip. The most likely mechanism is the decomposition of atmospheric adsorbate with subsequent deposition of carbon structures. This makes it possible to grow a spike of a few hundred nanometers in length on the tip. We further demonstrate that probes obtained by this method can be used for high-resolution scanning. It is important to note that all process operations are carried out in situ, in air and do not require the use of closed chambers or any additional equipment beyond the atomic force microscope itself. Published by AIP Publishing.
| Тип объекта: | Статья |
|---|---|
| Дополнительная информация: | 21st Topical Conference on High-Temperature Plasma Diagnostics, Madison, WI, JUN 05-09, 2016 |
| Авторы на русском. ОБЯЗАТЕЛЬНО ДЛЯ АНГЛОЯЗЫЧНЫХ ПУБЛИКАЦИЙ!: | Темирязев А.Г., Божко С.И., Эдвард А., Темирязева М.П. |
| Подразделения (можно выбрать несколько, удерживая Ctrl): | 196 лаб. спин-волновых процессов в миллиметровом и субмиллиметровом диапазонах длин волн |
| URI: | http://cplire.ru:8080/id/eprint/3393 |
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