| 1985–1988 | 
Engineer in Institute Volna, Moscow. Specialization - thick film technology | 
| 1988-1990 | 
Senior engineer in Centre of physics and technology, Moscow. Specialization – measurement of complementary MOS devices | 
| 1991-1993 | 
Postgraduate student in Institute of crystallography RAS, Moscow. Specialization physics of solid state | 
| 1993-2002 | 
Junior researcher, later researcher, in the Institute of crystallography. Scientific interest: physics of bicrystal high – TC Josephson junctions | 
| 2002-present | 
Researcher in Kotelnikov Institute of Radio-Engineering and Electronics RAS, Moscow |